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TETRAKIS(ETHYLMETHYLAMINO)ZIRCONIUM CAS#: 175923-04-3
IdentificationPhysical DataSpectraRoute of Synthesis (ROS)Safety and HazardsOther Data

Identification

Product NameTETRAKIS(ETHYLMETHYLAMINO)ZIRCONIUMIUPAC Nameethyl(methyl)azanide;zirconium(4+)Molecular StructureCAS Registry Number 175923-04-3MDL NumberMFCD03427131SynonymsTetrakis(ethylmethylamino)zirconium175923-04-3Tetrakis(ethylmethylamino)zirconium(IV)ethyl(methyl)azanide;zirconium(4+)MFCD03427131Tetrakis(ethylmethylamido)zirconium(IV)SCHEMBL328877AKOS015910994?TETRAKIS(ETHYLMETHYLAMINO)ZIRCONIUMCS-0111417Tetrakis(ethylmethylamino)zirconium 99.999%Tetrakis(ethylmethylamido)zirconium(IV), >=99.99% trace metals basisTetrakis(ethylmethylamido)zirconium(IV), packaged for use in deposition systemsMolecular FormulaC12H32N4ZrMolecular Weight323.63InChIInChI=1S/4C3H8N.Zr/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4InChI KeySRLSISLWUNZOOB-UHFFFAOYSA-NIsomeric SMILESCCC.CCC.CCC.CCC.

Physical Data

AppearanceColorless to yellow liquid

Spectra

No data available

Route of Synthesis (ROS)

No data available

Safety and Hazards

Pictogram(s)SignalDangerGHS Hazard StatementsH225 (98.55%): Highly Flammable liquid and vapor H226 (33.33%): Flammable liquid and vapor H261 (63.77%): In contact with water releases flammable gas H314 (34.78%): Causes severe skin burns and eye damage H315 (63.77%): Causes skin irritation H319 (63.77%): Causes serious eye irritation H335 (100%): May cause respiratory irritation Precautionary Statement CodesP210, P231+P232, P233, P240, P241, P242, P243, P260, P261, P264, P264+P265, P271, P280, P301+P330+P331, P302+P352, P302+P361+P354, P303+P361+P353, P304+P340, P305+P351+P338, P305+P354+P338, P316, P319, P321, P332+P317, P337+P317, P362+P364, P363, P370+P378, P402+P404, P403+P233, P403+P235, P405, and P501(The corresponding statement to each P-code can be found at the GHS Classification page.)

Other Data

Use PatternTETRAKIS(ETHYLMETHYLAMINO)ZIRCONIUM CAS#: 175923-04-3 may be used as a metal-organic precursor for thin film deposition in semiconductor manufacturing. It serves as a source of zirconium for the preparation of thin film coatings, such as in the fabrication of integrated circuits and other electronic devices.
https://www.chemwhat.com/tetrakisethylmethylaminozirconium-cas-175923-04-3/

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